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Metrology

  • Ellipsometry for film thickness and refractive index
  • Critical dimension measurement
  • Profilometry
  • White light interferometry
  • Thin film stress
  • Particle count
  • Four point probe (silicon resistivity)
  • Mgauge (metal thickness/resistivity)
  • SEM with EDAX Capability for elemental analysis

Plasma_Etch Diffusion thin Films Deep Reactive Ion Etching Spin on Coatings Wet Chemical Etch Metrology Physical Vapour Disposition (PVD) Dry Isotropic EtchWafer BondingPhoto Lithography
Newark Road South Eastfield Industrial Estate Glenrothes Fife KY7 4NS +44 (0)1592 630630