logo

Plasma Etch

  • Silicon, Nitride, Polysilicon, SiCr and TiW plasma etch (SF6, SF6/O2)
  • Oxide and Oxynitride plasma etch (C2F6, CHF3)
  • Aluminium plasma etch (BCl3, Cl2, CH4, N2, CF4, O2)
  • Resist and Polyimide etch (O2, CF4)

Plasma_Etch Diffusion thin Films Deep Reactive Ion Etching Spin on Coatings Wet Chemical Etch Metrology Physical Vapour Disposition (PVD) Dry Isotropic EtchWafer BondingPhoto Lithography
Newark Road South Eastfield Industrial Estate Glenrothes Fife KY7 4NS +44 (0)1592 630630