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Process Capability

Semefab supports a diverse process portfolio throughout its fab operations, as is referenced within the specific wafer fab pages of CMOS1, MEMS2 and CMOS3 foundries.

The image to the right illustrates the ‘process functions’ used throughout the fab operations. Clicking on specific process functions will display more detailed information about the specific capability presently available.

Semefab is a custom foundry and as such we are accustomed to developing, optimising and inducting customer specific solutions in a cost effective manner.

Contact 
Ian McNaught if you have specific needs which are not illustrated here.

Plasma_Etch Diffusion thin Films Deep Reactive Ion Etching Spin on Coatings Wet Chemical Etch Metrology Physical Vapour Disposition (PVD) Dry Isotropic EtchWafer BondingPhoto Lithography
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