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CMOS1 Foundry
MEMS Design and Development
MEMS2 Foundry
CMOS3 Foundry
Process Capability
Spin on Coatings
Resists, including lift off resist for metal patterning
Photo definable Polyimide for Passivation Layers
Sacrificial Polyimide for MEMS structuring.
Thick resist processing for DRIE and etching sacrificial layers.
Newark Road South Eastfield Industrial Estate Glenrothes Fife KY7 4NS +44 (0)1592 630630