Plasma etching
Silicon, Nitride and TiW plasma etch (SF6, SF6/O2)
Oxide and Oxynitride plasma etch (C2F6, CHF3)
Aluminium plasma etch (BCl3, Cl2, CH4, N2, CF4, O2)
Resist and Polyimide etch (O2, CF4)
Semefab Capability
Semefab becomes independent
Press Release - ACUITY
Press Release - LIONAX
Press Release - MEMS Fab 2
Further Expansion at Semefab
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